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本文概述了LB超薄抗蚀层用于光刻研究的历史及现状，指出：发展实用化的LB超薄抗蚀层技术对于微电子工业中深亚微米乃至纳米水平的微细加工具有重要的意义。
This paper presents an overview of the history and current status of LB ultra-thin resist used in photolithography research. It is pointed out that the development of practical LB ultra-thin resist technology is of great significance for micro-fabrication in the deep-submicron and nano-scale in the microelectronics industry .