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为了制备高输出功率的441.6nm氦-镉激光反射镜,研究了氧离子束辅助工艺及退火后处理对ZrO2单层膜及441.6nm氦-镉激光器ZrO2/SiO2反射膜的影响。利用紫外-可见分光光度计测试了薄膜样品的反射光谱及吸收光谱;通过原子力显微镜测试了薄膜表面的粗糙度。测量及分析结果表明:氧离子束辅助沉积能够提高激光反射镜的反射率并形成致密的薄膜结构,但是由于引入的杂质缺陷提高了薄膜的吸收率从而使得激光的输出功率变小;退火处理消除了吸附于薄膜表面的杂质气体、水分,输出功率相比于退火前有了大幅度的提高。
In order to prepare a high output power 441.6nm helium-cadmium laser mirror, the effects of the oxygen ion beam assisted process and the post-annealing treatment on the ZrO2 / SiO2 reflective film of the ZrO2 single layer film and the 441.6nm He-Cd laser were studied. The reflection spectra and absorption spectra of the films were measured by UV-visible spectrophotometer. The roughness of the films was measured by atomic force microscopy. The results of measurement and analysis show that oxygen ion beam assisted deposition can increase the reflectivity of the laser mirror and form a dense film structure, but due to the introduction of impurity defects, the absorption rate of the film is increased and the output power of the laser becomes smaller. The annealing treatment is eliminated Adsorbed on the film surface of the impurity gas, moisture, output power compared to before annealing has been greatly improved.