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罗门哈斯电子材料公司微电子技术事业部与道康宁公司日前宣布延展双方的共同开发协议,针对65nm以下的快闪DRAM和逻辑元件合作开发创新的旋涂式硅硬膜抗反射涂层产品。这项合作是在两年前展开的,在此期间成功推出首款商用旋涂式硬膜材料,并有多家亚洲客户将它导入高量产快闪DRAM
Rohm and Haas Electronic Materials and Microelectronics Division and Dow Corning Corporation today announced the extension of their joint development agreement for the development of innovative spin-on silicon hard film anti-reflective coatings for flash DRAMs and logic devices under 65nm. The collaboration was launched two years ago during which the first commercial spin-on die-hard material was successfully launched and several Asian customers have imported it into high-volume flash DRAM