ＳＯＩ器件应用展望东立摘编绝缘体上硅（ＳＯＩ）衬底以优良的材料特性和适中的价格／性能比，使其成为高性能ＩＣ技术开发的热点。自８０年代末，人们对ＳＯＩ衬底技术本身的研究也不断加强，而最引人们关注的是氧注入硅衬底（ＳＩＭＯＸ）和粘合与背面腐蚀ＳＯＩ（ＢＥ... Application prospect of SOI devices Tung Li Extractive silicon on insulator (SOI) substrate with excellent material properties and moderate price / performance ratio, making it a high-performance IC technology development hot spots. Since the late 1980s, research on SOI substrate technology itself has been continuously strengthened, and the most notable concerns are SIMOX and SOI (Back-to-back etching).