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该机为电子工业部四十八研究所最近研制成功的新产品,构思新颖,结构紧凑,技术性能先进,并兼有立式、卧式两种加工方式。主要性能指标离子束有效束径:φ80毫米和φ40毫米两种。束流能量:100～1000ev连续可调。束流密度:0.2～1.0毫安/厘米~2。束流密度均匀性:有效束径内≤±5％。束流稳定性:一小时内≤±2％。真空度:极限真空≤5×10~(-6)托。工作真空≤3×10~(-4)托。
The machine for the Ministry of Electronics Industry forty-eight Institute recently developed a new product, innovative ideas, compact structure, advanced technical performance, and both vertical and horizontal processing methods. The main performance indicators Ion beam effective beam diameter: φ80 mm and φ40 mm two. Beam energy: 100 ~ 1000ev continuously adjustable. Beam density: 0.2 ~ 1.0 mA / cm ~ 2. Beam density uniformity: within ± 5% of effective beam diameter. Beam stability: ≤ ± 2% within one hour. Vacuum: the ultimate vacuum ≤ 5 × 10 ~ (-6) care. Working vacuum ≤ 3 × 10 ~ (-4) care.