利用电子蚀刻在片子上作图的方法有两种:1、用聚焦很细的电子束对每个元件作连续曝光,即连续电子蚀刻;2、在电子射线中投射整个掩模图象,即投影电子蚀刻。在这两种情形下,电子蚀刻过程本质上可归结为:在片子表面涂敷对电子轰击敏感的抗蚀剂薄层,用电子射线连续曝光和显影。电子蚀刻比光刻有着一系列本质上的优越性。首先,电子射线对胶曝光时,因为运动电子的波长λ((?))为λ=(150/V)~(1/2)式中,V为加速电压(伏),衍射的影响比光刻 There are two ways of using electronic etching to make a picture on a film: 1. Continuous exposure of each element with a very finely focused electron beam, ie, continuous electron etching. 2. Projecting the entire mask image in electron beams, ie, Projected electronic etching. In both cases, the electronic etching process can be essentially attributed to applying a thin layer of resist sensitive to electron bombardment to the surface of the film, exposing and developing it electron beamwise. Electronic etching has a number of essential advantages over lithography. First, the electron beam exposure to glue, because the moving electron wavelength λ ((?)) Is λ = (150 / V) ~ (1/2) where V is the accelerating voltage (V), the diffraction effect than the light engraved