在离子注入机、离子束蚀刻机、离子束镀膜机等离子束设备中,离子束流的稳定性是一个值得重视的问题。由于束流的不稳定,将会给器件加工及材料的分析研究带来一系列误差。所以对于离子束流稳定方法,尤其是长时间稳定方法的研究,引起了越来越多的关注。影响束流稳定的因素很多,如工作气体流量、阳极电压、灯丝电压、离子源栅极引出系统热变形等。但总的原则,不外乎是利用负反馈的办法,控制影响束流的某 In the ion implanter, ion beam etching machine, ion beam coating machine plasma beam device, the stability of ion beam current is a problem worthy of attention. Due to the instability of the beam, it will bring a series of errors to the processing and material analysis of the device. So for ion beam stabilization methods, especially the long-term stability of the method, attracted more and more attention. Many factors affect the stability of the beam, such as the working gas flow, the anode voltage, filament voltage, the ion source grid leads to thermal deformation and other systems. However, the general principle is nothing more than using negative feedback to control the impact of a certain beam