硅基二氧化硅光波导是光通信中的关键器件.采用光刻胶以及金属作为掩膜进行了反应离子刻蚀二氧化硅光波导的工艺研究,获得了刻蚀速率及刻蚀选择比相对各工艺参数变化的三维神经网络模型.利用一种新型的用于二氧化硅深刻蚀的复合双层掩膜结构,克服了许多单层掩膜自身的限制,并利用这一结构制作出低传输损耗的硅基二氧化硅波导. Silicon-based silicon dioxide optical waveguide is the key device in optical communication.Researching on the process of reactive ion-etching silica optical waveguide using photoresist and metal as the mask, we obtain the etching rate and etching selectivity ratio The three-dimensional neural network model that varies the process parameters overcomes the limitations of many single layer masks using a novel double mask structure for deep etching of silicon dioxide and utilizes this structure to create a low transmission Losses of silicon-based silica waveguide.