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微电子学中的光学曝光方法已达到其分辨率极限,因此,提出了电子束曝光和x射线曝光两种新技术。虽然这两种技术在实验室里已证明是可行的,但还不适用于生产过程。本文介绍一种用于生产的电子束投影系统,此系统能在三吋直径的成象平面上制作亚微米图形。所描述的电子投影系统配有控制掩模同片子对准的计算机以及真空系统中加工片子的自动操作系统。
Optical exposure in microelectronics has reached its resolution limit, therefore, proposed two new technologies, electron beam exposure and x-ray exposure. Although these two technologies have proved viable in the laboratory, they are not yet suitable for the production process. This article describes an electron beam projection system for production that produces submicron patterns on a three inch diameter imaging plane. The described electronic projection system is equipped with a computer that controls the alignment of the mask with the film and an automated system for processing the film in the vacuum system.