本文报导了用氦氖激光光源的椭圆度仪测量硅片上透明薄膜厚度和折射率的技术。文中阐述了方法的原理、实验的装置和调整方法,并给出了对于氦氖激光光源所需的一套理论数据。作者用自行装置的椭圆度仪测量了硅片上二氧化硅膜和氧化铝膜的厚度和折射率,证实了本方法的可靠性。 This paper reports the technique of measuring the thickness and refractive index of a transparent thin film on a silicon wafer using an ellipticity instrument of a He-Ne laser source. This paper describes the principle of the method, the experimental device and the method of adjustment, and gives a set of theoretical data needed for a He-Ne laser light source. The authors measured the thickness and refractive index of the silicon dioxide film and the aluminum oxide film on a silicon wafer using a self-mounted ovality tester, confirming the reliability of the method.