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使用扫描电子显微镜、电子能谱仪、X射线衍射仪对经1050℃等温热处理10h的SiC/Ni3Al界面固相反应层的成分分布、微结构及相组成等进行了研究。结果表明:SiC/Ni3Al界面固相反应层由Ni5.4Al1Si2、石墨态C及NiAl构成,反应物原子(Si,C,Ni和Al)在反应层中连续分布,均呈现下坡扩散的特征。反应层由随机C沉积区(random carbon precipitation zone,R-CPZ)及无碳沉积区(carbon precipitation free zone,C-PFZ)两个亚层构成。其中,R-CPZ靠近SiC侧,主要由Ni5.4Al1Si2构成,片状和颗粒状的石墨态C随机地分布其中;C-PFZ靠近Ni3Al侧,主要由Ni5.4Al1Si2及NiA构成,不含有石墨态C。
The composition distribution, microstructure and phase composition of the SiC / Ni3Al interfacial solid-state reaction layer were investigated by scanning electron microscopy, electron spectroscopy and X-ray diffractometry after being isothermally treated at 1050 ℃ for 10h. The results show that the SiC / Ni3Al interfacial solid-state reaction layer is composed of Ni5.4Al1Si2, graphite state C and NiAl. The reactant atoms (Si, C, Ni and Al) are continuously distributed in the reaction layer, showing the characteristics of downhill diffusion. The reaction layer consists of two sub-layers of random carbon precipitation zone (R-CPZ) and carbon precipitation free zone (C-PFZ). Among them, R-CPZ near the SiC side, mainly composed of Ni5.4Al1Si2, flaky and granular graphite state C randomly distributed therein; C-PFZ near the Ni3Al side, mainly composed of Ni5.4Al1Si2 and NiA, does not contain graphite state C.