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Annealing effect on the performance of fully transparent thin-film transistor(TTFT),in which zinc tin oxide(ZnSnO)is used as the channel material and SiO2as the gate insulator,is investigated.The ZnSnO active layer is deposited by radio frequency magnetron sputtering while a SiO2gate insulator is formed by plasma-enhanced chemical vapor deposition.The saturation field-effect mobility and on/off ratio of the TTFT are improved by low temperature annealing in vacuum.Maximum saturation field-effect mobility and on/off ratio of 56.2 cm2/(V·s)and 3×105are obtained,respectively.The transfer characteristics of the ZnSnO TFT are simulated using an analytical model and good agreement between measured and the calculated transfer characteristics is demonstrated.
Annealing effect on the performance of fully transparent thin-film transistor (TTFT), in which zinc tin oxide (ZnSnO) is used as the channel material and SiO2 as the gate insulator, is investigated. The ZnSnO active layer is deposited by radio frequency magnetron sputtering while a SiO2gate insulator is formed by plasma-enhanced chemical vapor deposition. The saturation field-effect mobility and on / off ratio of the TTFT are improved by low temperature annealing in vacuum. Maximum saturation field-effect mobility and on / off ratio of 56.2 cm2 / (V · s) and 3 × 105are obtained, respectively. The transfer characteristics of the ZnSnO TFT are simulated using an analytical model and good agreement between measured and the calculated transfer characteristics is demonstrated.