近来在电子元件、光元件的生产方面,薄膜技术有了显著的发展,通过蒸镀、喷镀等工序制成的各种薄膜,若构成它的各种元素的比例不同或膜厚不同,将会大大地影响元件的性能和质量,通常用光干涉法、比电阻法、红外吸收法及离子腐蚀比率法等方法对薄膜进行分析,但各种方法都有分析对象有限或达不到必要的精度等实际问题。 Recently in the production of electronic components and optical components, there has been a remarkable development in thin film technology. Various thin films formed by processes such as vapor deposition and thermal spraying, if the proportions of the various elements constituting the same or the film thickness are different, Will greatly affect the performance and quality of the components, usually by light interference method, resistivity method, infrared absorption method and ion etching ratio method and other methods of film analysis, but all methods have limited or less than the analysis of the necessary Accuracy and other practical problems.