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提出了一种可对大矢高、非球面微透镜阵列面形进行精确控制的新方法。针对不同面形的微透镜阵列 ,该方法首先对光致抗蚀剂表面的曝光分布进行设计 ,然后 ,利用光致抗蚀剂显影过程中的阈值特性 ,对微透镜的面形实行控制。当抗蚀剂显影速率接近 0时 ,即可获得设计的微透镜面形。该方法不仅大大提高了微透镜阵列矢高的加工范围 ,而且还减小了光刻材料显影特性对微透镜面形的影响 ,提高了微透镜阵列的面形控制精度 ,在实验中获得了矢高达 114 μm的微透镜阵列。最终实现了大浮雕深度、大数值孔径、非球面微列阵光学元件的面形控制。
A new method is proposed to precisely control the surface shape of large vector and aspheric microlens arrays. For different surface shape microlens arrays, the method first designs the exposure distribution of the photoresist surface, and then controls the surface shape of the microlens by utilizing the threshold characteristic in the process of developing the photoresist. When the resist development rate approaches 0, the designed microlens profile is obtained. The method not only greatly increases the processing range of the microlens array, but also reduces the influence of the lithographic material developing characteristics on the microlens surface shape and improves the surface shape control precision of the microlens array. In the experiment, 114 μm microlens array. Finally, a large embossed depth, large numerical aperture, aspherical micro-array optical element surface shape control.