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本文作者所设计的实验是利用光学中全反射衰减特性方法测量在介质上蒸镀的金属薄膜的厚度和各种频率下的复介电常数等物理性质，它可以精确测定１００～１０００范围内金属膜层的厚度和ε（ω）值，以及一些其它性质，是研究固体表面物理的一种有效的方法和技术。
The experiment designed by our author is to use the method of total reflection attenuation in optics to measure the thickness of the metal thin film deposited on the medium and the complex dielectric constant under various frequencies and other physical properties. It can accurately measure the range of 100 ~ 1000 The thickness and ε (ω) values of the inner metallic film, as well as some other properties, are an effective method and technique for studying solid surface physics.