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以三羟甲基丙烷(TMP)、3-巯基丙酸为主要原料,采用酯化反应法合成了一种重要的巯基酯类光敏性单体TMPMP[三羟甲基丙烷三(3-巯基丙酸酯)]。通过单因素试验法优选出合成TMPMP的最佳工艺条件,并采用红外光谱(FT-IR)法、核磁共振氢谱(1H-NMR)法和元素分析法等对TMPMP结构进行了表征。结果表明:当m(TMP)=6.71 g、m(3-巯基丙酸)=19.10 g、m(催化剂对甲苯磺酸)=0.59 g、V(携水剂甲苯)=40 mL和反应时间为1.5 h时,产物酯化率为98.6%,收率为79.6%;以TMPMP作为UV固化胶的光敏性单体,以三羟甲基丙烷三丙烯酸酯(TMPTA)为主要原料,制成的巯基/烯烃UV固化胶具有良好的固化性能及耐热性能,满足光学领域的应用要求。
An important thiol ester photoactive monomer, TMPMP, was synthesized by esterification using trimethylolpropane (TMP) and 3-mercaptopropionic acid as the main raw materials [trimethylolpropane tris (3-mercaptopropane- Acid ester)]. The optimum conditions for the synthesis of TMPMP were optimized by single factor test. The structure of TMPMP was characterized by FT-IR, 1H-NMR and elemental analysis. The results showed that when m (TMP) = 6.71 g, m (3-mercaptopropionic acid) = 19.10 g, m (p-toluenesulfonic acid) = 0.59 g, V 1.5 h, the product esterification rate of 98.6%, the yield of 79.6%; TMPMP as a UV curable adhesive photosensitive monomer to trimethylolpropane triacrylate (TMPTA) as the main raw material, made of mercapto / Olefin UV curing adhesive has good curing properties and heat resistance, to meet the application requirements of the optical field.