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采用 X 射线光电子能谱(XPS)和俄歇电子能谱(AES)方法分析了钼在不同溶液及不同电位-pH 条件下所生成的表面膜。结果表明:(1)在低电位区生成的钝化膜是一种低价(很可能是4价)的氧化物或水合氧化物,在无氧溶液中稳定,膜极薄但保护性很好;(2)在较高电位的过钝化区所生成的表面膜的最终稳态物质是无水 MoO_3;(3)在 FeCl_2溶液中较高电位的第二钝化区中所生成的表面膜,其外层为 Fe_2O_3,内层则可能是由 FeMoO_4组成。AES 和XPS 分析结果证实了本文作者之一(杨武,与 A.Pourbaix 先生合作)早先绘制的 Mo-H_2O系电位-pH 平衡图以及所提出的在钢的局部腐蚀发展过程中钼的阻蚀作用机理的有效性。
The surface films of molybdenum formed under different solutions and potentials-pH were analyzed by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES). The results show that: (1) the passivation film formed in the low potential region is a low-priced (probably tetravalent) oxide or hydrated oxide that is stable in anaerobic solution with a very thin film but good protective properties ; (2) the final steady state material of the surface film generated in the overpassivation region of higher potential is anhydrous MoO 3; (3) the surface film generated in the second passivation region of higher potential in the FeCl 2 solution , The outer layer of Fe_2O_3, the inner layer may be composed of FeMoO_4. AES and XPS analysis confirmed earlier Mo-H20-based potential-pH equilibria plotted by one of the authors (Yang Wu, in cooperation with A. Pourbaix) and the proposed corrosion resistance of molybdenum during local corrosion development of the steel The effectiveness of the mechanism of action.