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最近出现了各种用干法制作材料的方法,例如,采用真空蒸镀法和溅射法制薄膜。但由于其成膜速度很慢,所以实用化受到限制。近来又出现了利用等离子技术制造薄膜的方法。为了避免离子对基板的伤害,又研究了仅用自由基离子,由光激发的办法制作薄摸。构成薄膜的要素是原子,如以其附着于基板上的形态分类,大致可分为三类:1.蒸镀;2.溅射;3.在气体和基板界面反应。现将这三种干法制膜技术分述如下。
Recently, various methods of producing materials by dry methods have emerged, for example, thin films by vacuum deposition and sputtering. However, due to its slow film-forming speed, practicality is limited. Recently there has been a use of plasma technology to produce thin films. In order to avoid ion damage to the substrate, but also studied the use of only free radical ions, the light-induced approach to making thin touch. The elements that make up the thin film are atoms and can be classified into three categories as follows: 1. vapor deposition; 2. sputtering; 3. reaction at the gas-substrate interface. Now these three dry film technology are as follows.