一、前言在大规模集成电路制造过程中,光刻中的掩膜对准是极其重要的一道工序。随着集成度的不断提高,电路图线的微细化,使制造更加困难。为了保证质量,其中一个重要环节就是对准精度。用人工对准,不但操作者容易疲 I. INTRODUCTION In the process of manufacturing large scale integrated circuits, the alignment of masks in lithography is an extremely important process. As integration continues to increase, the miniaturization of circuit diagrams makes manufacturing more difficult. In order to ensure the quality, one of the important links is the alignment accuracy. With manual alignment, not only the operator easy to fatigue