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用热丝化学气相(HFCVD)法在硅衬底上制备了表面光滑、晶粒致密均匀的纳米金刚石薄膜,用扫描电镜(SEM)和原子力显微镜(AFM)观测薄膜的表面形貌和粗糙度,拉曼光谱表征膜层结构,紫外-可见光分光光度计测量其光透过率,并用椭圆偏振仪测试、建模、拟合获得了表征薄膜光学性质的n,k值.结果表明薄膜的晶粒尺寸在100nm以下,表面粗糙度仅为21nm;厚度为3.26(m薄膜在632.8nm波长处的透过率为25%,1100nm波长处达到50%.采用直接光跃迁机制估算得到纳米金刚石薄膜的光学能隙(Eg)为4.3 eV.
The surface morphology and roughness of the films were observed by scanning electron microscopy (SEM) and atomic force microscopy (AFM). The surface morphology and roughness of the films were characterized by FTIR, Raman spectroscopy was used to characterize the film structure. The light transmittance of the film was measured by ultraviolet-visible spectrophotometer. The optical transmittance was measured by ellipsometer, and the n, k values were obtained by modeling and fitting. The size is below 100nm, the surface roughness is only 21nm, the thickness is 3.26 (The transmittance of m film is 25% at the wavelength of 632.8nm and 50% at the wavelength of 1100nm. The direct optical transition mechanism is used to estimate the optical properties of the nano-diamond film The energy gap (Eg) is 4.3 eV.