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以有机高分子化合物酒精和氢气为反应气体，用热丝 CVD法在 Al2O3陶瓷基片上沉积出 金刚石薄膜 ,用拉曼光谱， X射线衍射等方法进行了表征。探索了碳源浓度、热丝温度、基片温度 和预处理工艺对金刚石薄膜结构和性能的影响，并且得到了最佳的工艺条件。探讨了金刚石在 Al2O3衬底上的成核和生长机理。
Diamond films were deposited on the Al2O3 ceramic substrate by hot filament CVD using organic polymer compounds of alcohol and hydrogen as reaction gases, and were characterized by Raman spectroscopy and X - ray diffraction. The effects of carbon source concentration, hot wire temperature, substrate temperature and pretreatment process on the structure and properties of diamond films were explored, and the optimum technological conditions were obtained. The mechanism of nucleation and growth of diamond on Al2O3 substrate was discussed.