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基于光学元件离子束高精度确定性抛光技术,在自行研制的离子束抛光机床上,本文研究了离子束倾斜入射抛光对光学材料熔石英表面粗糙度的影响.为了在离子束抛光中改善表面粗糙度,采用了0°～80°之间不同入射角度的离子束倾斜抛光和倾斜45°入射均匀去除两种实验方案进行研究,其中不同入射角度抛光实验研究结果表明:离子束垂直入射抛光较难改善表面粗糙度,倾斜入射抛光可以较好地改善表面粗糙度,入射角为30°～60°之间时抛光效果最佳,表面粗糙度得到明显改善;倾斜45°入射均匀去除抛光实验结果表明表面粗糙度的RMS值由抛光前(0.92±0.06)nm下降到(0.48±0.04)nm,提高了光学零件的表面质量,验证了离子束倾斜入射抛光可以较好地改善表面粗糙度,实现了离子束倾斜抛光超光滑表面的生成.
Based on the high-precision deterministic polishing technology of optical element ion beam, this paper studied the effect of oblique-beam incident ion beam polishing on the surface roughness of fused silica in the ion beam polishing machine.In order to improve the surface roughness Degrees, two kinds of experimental schemes are studied, which are the ion beam inclined polishing with different incident angles between 0 ° and 80 ° and the uniform dip inclined 45 °. The experimental results at different incident angles show that it is more difficult to polish the ion beam vertically Improve the surface roughness, oblique incidence polishing can better improve the surface roughness, when the angle of incidence of 30 ° ~ 60 ° between the best polishing effect, the surface roughness was significantly improved; tilt 45 ° incident uniform removal polishing results show that The RMS value of the surface roughness decreased from (0.92 ± 0.06) nm to (0.48 ± 0.04) nm before polishing, which improved the surface quality of optical components. It was verified that the ion beam tilted incidence polishing can improve the surface roughness, Ion beam tilt polishing super smooth surface generation.