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评述了在等离子体刻蚀和沉积中会引起沾污,辐射损伤或表面轰击损伤的光辉放电的物理效应.用内外电极的反应器的效应是不同的,除了测量各种系统的电位以外,还分析了两种反应器中重要区域的电条件.证实了以下两点:基片、内壁和内电极的作用如同射频溅射的靶;而测得的电位与反应器的几何形状及工作条件有关.还提供了减少沾污和损伤的方法.
The physical effects of a glow discharge that can cause staining, radiation damage, or surface bombardment damage during plasma etching and deposition are reviewed.The effect of the reactor with internal and external electrodes is different and in addition to measuring the potential of various systems The electrical conditions in the important regions of the two reactors were analyzed and the following two points were confirmed: the substrate, the inner wall and the inner electrode function as the target for radio frequency sputtering; and the measured potential is related to the reactor geometry and working conditions There are also ways to reduce contamination and damage.