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通过改变固态纳米孔薄膜厚度,揭示了λ-DNA在电场作用下通过纳米孔时堵塞离子电流的作用机理.纳米孔的电导主要由孔内电阻和孔口电阻构成,当纳米孔长度逐渐减小到与原子层厚度相等时,电导主要由孔口电阻主导.根据已有的纳米孔孔口电阻模型,推导出一个简化的DNA分子堵塞纳米孔的相对离子电流模型,定量地描述了纳米孔薄膜厚度与相对堵塞电流大小之间的关系.结果表明,相对堵塞电流随着纳米孔直径的减小而增加,但随着纳米孔厚度的减小而减小.为提高相对堵塞电流,提出了一种二级结构,该结构设置了一个更小的纳米孔孔口电阻区域.实验结果显示,该结构使相对堵塞电流提高了21.9%.
By changing the thickness of the solid-state nanopore film, the mechanism of blocking ion current when λ-DNA passes through the nanopore under the electric field is revealed. The conductance of the nanopore is mainly composed of pore resistance and pore resistance. When the nanopore length decreases When the thickness of the atomic layer is equal to that of the atomic layer, the conductance is mainly dominated by the aperture resistance.On the basis of the existing nanopore impedance model, a simplified model of the relative ion current of the nanopore blocked by the DNA molecule is deduced and the nanoporous film is quantitatively described The results show that the relative blocking current increases with the decrease of the nanopore diameter but decreases with the decrease of the nanopore thickness.In order to increase the relative blocking current, This structure provides a smaller area of nanopore orifice resistance.The experimental results show that the structure increases the relative clogging current by 21.9%.