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在原子尺度观察组织结构并理解它和性质之间的关系是物质科学追求的目标之一.纳米科技、信息器件微型化、先进制造精密化等领域的快速发展,对材料显微表征深入到原子排列、电子结构层次起到了重要的推动作用.集形貌观察、结构诠释、元素分析于一身的透射电子显微镜近年来因像差校正器的突破而有望将上述三项功能都推进到原子分辨水平.本文介绍像差校正电子显微镜给材料显微研究带来的新契机:(1)像差校正电子显微学(提高分辨率、减少离位效应、负球差成像、系列离焦像);(2)走向原子柱元素分辨的化学分析;(3)三维原子像;(4)复杂结构的界面;(5)时间分辨电子显微术;(6)电子全息;(7)原位电子显微术(较大极靴间隙).
Observing the structure of an organism at the atomic scale and understanding the relationship between it and its properties is one of the goals pursued by the material science.Nano-science and technology, miniaturization of information devices, advanced manufacturing precision and other fields are developing rapidly, Arrangement and electronic structure plays an important role in promoting.Trapping electron microscopy, which combines morphology observation, structural interpretation and elemental analysis, is expected to push the above three functions to the level of atomic resolution in recent years due to the breakthrough of aberration correctors This article introduces new opportunities for aberration correction electron microscopy for material microscopy: (1) aberration correction electron microscopy (improved resolution, reduced out - of - position effect, negative spherical aberration imaging, series of defocused images); (2) chemical analysis of atomic columnar elemental resolution; (3) three-dimensional atomic images; (4) interface of complex structures; (5) time-resolved electron microscopy; Micro-surgery (larger pole gap).