Titanium dioxide (TiO2) films with anatase structure were prepared on quartz glass substrates by pulse laser ablating titanium (99.99%) target under oxygen pressure of 10 Pa at substrate temperature of 500-800 ℃. The structural properties of the films were characterized by X-ray diffractometry(XRD), X-ray photoelectron spectroscopy(XPS) and field emission scan electron microscopy(FESEM). The results show that, as the substrate temperature is increased from 600 ℃ to 800 ℃, the anatase structure of the films changes from random growth to (211)-oriented growth. The absorption edge tested by UV-Vis Spectrometer has a blue shift. The photocatalytic activity of the films was tested on the degradation of methyl orange. It is found that the film with random growth structure exhibits better photo-degradation efficiency than that with (211)-oriented growth structure. Titanium dioxide (TiO2) films with anatase structure were prepared on quartz glass substrates by pulse laser ablating titanium (99.99%) target under oxygen pressure of 10 Pa at substrate temperature of 500-800 ° C. The structural properties of the films were characterized by X The results show that as the substrate temperature is increased from 600 ° C to 800 ° C, the anatase structure of the films changes (XPS) and field emission scan electron microscopy (FESEM) The randomness to the (211) -oriented growth. The absorption edge tested by UV-Vis Spectrometer has a blue shift. The photocatalytic activity of the films was tested on the degradation of methyl orange. It is found that the film with random growth structure exhibits better photo-degradation efficiency than that with (211) -oriented growth structure.