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本文回顾了薄膜的激光诱发淀积的进展.原则上,膜的光激活化学气相淀积依据于三大机理.施主分子光分解及随后的反应和凝聚;衬底局部被加热后,随之在这些位置上的热分解;以及在紧靠衬底附近所需物质的激光蒸发.这三种方法都已经用于淀积绝缘的、导电的和半导体的材料.讨论了大面积的和局部的淀积,重点在前者.激光诱发淀积的独特之处在于:工艺温度低、分解产物一定以及空间上有选择地淀积.介绍了在微电子器件制造中以前和将来的应用,考察了激光化学气相淀积在集成电路工艺中应用存在的问题和前景.
In this paper, the progress of laser-induced deposition of thin films is reviewed. In principle, the photo-activated chemical vapor deposition of films is based on three mechanisms: photolysis of donor molecules followed by reaction and condensation; Thermal decomposition at these locations; and laser evaporation of the desired material in the immediate vicinity of the substrate. All three of these methods have been used to deposit insulating, conductive and semiconducting materials. Large and partial The focus is on the former. Laser-induced deposition is unique in that the process temperature is low, the product of decomposition must be spatially and selectively deposited, and the previous and future applications in the fabrication of microelectronic devices are reviewed, Problems and Prospects of Application of Vapor Deposition in Integrated Circuit Technology.