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5. Advanced plasma sources for plasma and ion-beam technologies

Advanced plasma sources for plasma and ion-beam technologies

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：wcl929156

【摘 要】

：

Three types of the advanced plasma sources are represented,i.e.dc cold cathode and RF gridded ion sources as well as prolonged plasma source operating at atmospheric pressure.

【作 者】

：

E.A. Kralkina V.B.Pavlov K.V.Vavilin 

【机 构】

：

Physical Faculty of Moscow State University, Russia, Moscow 119991, GSP-1, Vorobjevy gory

【出 处】

：

2011年第三届微电子及等离子体技术国际会议

【发表日期】

：

2011年9期

【关键词】

：

Microelectronic Device Plasma Source Ion source RF DC Atmospheric discharge 

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Three types of the advanced plasma sources are represented,i.e.dc cold cathode and RF gridded ion sources as well as prolonged plasma source operating at atmospheric pressure.

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