Sm_22Co_78/Fe_65Co_35/Sm_22Co_78/Fe_35 multilaver films were prepared by magnetron sputtering. The temperature dependen......

The structural and mechanical properties of TiN coatings prepared by ion beam assisted deposition (IBAD) were studied. ......

Trilayers of Sm-Co/Mo/Fe were deposited by DC and RF magnetron sputtering on Si(100) substrate at 650 °C.Effect of very......

Spectrally selective TiAl/TiAlN/TiAlON/TiAlO coating was deposited on stainless steel and copper substrates using a mult......

A kind of combinatorial material methodology,also known as continuous compositional spread method,was employed to invest......

基板散热问题已成为制约大功率LED发展的重要因素.文章采用微弧氧化技术在铝合金基板上制备了氧化物绝缘层,并采用磁控溅射工艺在......

在室温下使用射频磁控溅射技术,在表面长有100 nm厚的氧化硅绝缘层的硅衬底上制备了MoZnO薄膜及其薄膜晶体管(TFTs).研究了溅射过......

采用直流磁控溅射在SiO2／n—Si（111）衬底上沉积了Al薄膜，经过光刻、刻蚀形成源漏极，再采用射频磁控溅射沉积ZnO薄膜作为有源层，成功制备......

用射频磁控反应溅射法在二氧化硅衬底上制备ZnO薄膜.得到了在不同温度下ZnO薄膜的吸收与光致发光.观测到了纵光学波(LO)声子吸收峰......

采用磁控溅射法结合结晶化热处理工艺在SiC颗粒表面成功制备了金属Mo涂层,分析Mo涂层的成分和形貌;采用热压烧结工艺制备SiCp/Cu复......

采用双靶共溅法制备了铜掺杂的碲化铋锑热电薄膜，铜与碲化铋锑共溅的方法有利于形成沿c轴方向择优生长的碲化铋锑薄膜。结果表明，铜......