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采用化学分析方法研究了表层掺硅Ｆｅ３Ｏ４微粒的氧化反应动力学。结果表明该反应前期为动力学控制，对［Ｆｅ２＋］为三级反应，后期为传质控制，对［Ｆｅ２＋］为一级反应；并发现随着掺硅量的增加，氧化反应速率随之增大。采用ＩＲ和ＸＲＤ方法探明了氧化过程中表层掺硅Ｆｅ３Ｏ４微粒的结构变化规律，发现掺硅导致红外吸收带向高频移动，转化率α＝０．６８是表层掺硅Ｆｅ３Ｏ４微粒氧化过程的转折点。
The oxidation reaction kinetics of silicon-doped Fe3O4 particles was studied by chemical analysis. The results showed that the reaction was kinetic at the beginning of the reaction, the third reaction was [Fe2 +], the second was the mass transfer control and the first reaction to [Fe2 +]. It was found that the oxidation reaction rate increased with the increase of silicon content Big. The IR and XRD methods were used to investigate the structure change of the silicon-doped Fe3O4 particles in the oxidation process. It was found that the infrared absorption bands were shifted to high frequency with silicon conversion. The conversion rate α = 0.68 was the turning point of the oxidation process of silicon-doped Fe3O4 particles .