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在纳米精度外差干涉仪中，由于非线性的温度漂移，成为外差干涉仪实现纳米精度测量的重要误差源。本文对差动干涉仪的理论分析得出了如下的结论：干涉仪中除了存在测量光路和参考光路以外，还存在参考光误差分量和测量光误差分量的额外光路，从而引入新的干涉混叠，产生非线性漂移；１／４波片的相位延迟量误差和安装误差是引入非线性漂移的主要因素，其影响程度是一阶的。提高波片加工精度，并尽量减少其级数可降低非线性漂移。
In the nanometer precision heterodyne interferometer, due to the nonlinear temperature drift, it becomes the important error source for the heterodyne interferometer to realize the nanometer precision measurement. In this paper, the theoretical analysis of the differential interferometer draws the following conclusion: In addition to the measurement optical path and the reference optical path, there are additional optical paths for the reference optical error component and the measurement optical error component to introduce a new interference aliasing , Resulting in nonlinear drift; 1/4 wave plate phase delay error and installation error is the introduction of nonlinear drift of the main factors, the degree of influence is first order. Improve wave plate processing accuracy, and to minimize its series can reduce the nonlinear drift.