论文部分内容阅读
采用中频磁控溅射技术在3种偏压条件下(0、-80、-300V)于AISI 440C钢及单晶Si(100)基体表面制备了ZrN/α-SiNx纳米多层薄膜.通过高分辨透射电子显微镜(HRTEM)分析表征了各纳米多层薄膜微观组织结构,并通过纳米压入仪与真空球-盘摩擦试验机分别测试了各薄膜力学及真空摩擦学性能.重点研究了基体偏压对ZrN/α-SiNx纳米多层薄膜微观组织结构,进而对其力学及摩擦学性能的影响机制.结果表明:较低的基体偏压会导致纳米多层薄膜中ZrN层差的结晶状态,而较高的基体偏压则易于引起ZrN层与SiNx层层间界面的交混.上述两种薄膜组织及结构的变化均不利于该纳米多层薄膜力学及摩擦学性能的改善.在适宜的偏压条件下(-80 V),ZrN/α-SiNx薄膜呈现出具备良好层间界面的晶体/非晶体纳米多层结构,与其他偏压条件制备的纳米多层薄膜相比,该薄膜表现出更好的力学及摩擦学性能.
The ZrN / α-SiNx nano-multilayered films were prepared on the surface of AISI 440C steel and single crystal Si (100) substrate by IF magnetron sputtering at three bias conditions (0, -80 and -300V) The microstructure of each multi-layered thin film was characterized by HRTEM and the mechanical and vacuum tribological properties of each film were tested by nanoindenter and vacuum ball-disk friction tester respectively. Pressure on the microstructure of ZrN / α-SiNx nano-multilayered films and their mechanical and tribological properties.The results show that the lower substrate bias will lead to the poor crystallization state of the ZrN layer in the nano-multilayered films, While the higher substrate bias tends to cause the intermixing of the interface between the ZrN layer and the SiNx layer.The changes of the microstructure and structure of the two films are not conducive to the improvement of the mechanical and tribological properties of the nano- Under bias conditions (-80 V), the ZrN / α-SiNx films exhibit a crystalline / amorphous multilayered structure with good interlayer interface. Compared with the nano-multilayer films prepared under other bias conditions, Out of better mechanical and tribological properties.