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为了给国内外从事光电技术研究的专家学者提供一次研讨光电子成像,光电子探测,图像处理,光电系统设计、制造与检测,相关技术与应用等领域的研究进展的机会,促进学术交流与技术合作,由中国兵工学会、北京理工大学和国际光学工程学会(SPIE)联合主办的第二届光电子探测与成像技术及应用国际学术会议,将于今年9月在北京召开。本次会议将邀请国内外在光电子成像,光电子探测,图像处理,光电系统设计、制造与检测,相关技术与应用领域中作出卓越成就的著名专家发表报告,预计本次会议规模将达到400人～500人。
In order to provide experts and scholars engaged in optoelectronic technology both at home and abroad with an opportunity to discuss research advances in the fields of optoelectronic imaging, photoelectron detection, image processing, optoelectronic system design, manufacturing and testing, related technologies and applications, and promote academic exchange and technical cooperation, The 2nd International Symposium on Photoelectronic Probing and Imaging Technology and Applications, co-sponsored by the Chinese Society of Ordnance Industry, Beijing Institute of Technology and the International Society for Optical Engineering (SPIE) will be held in Beijing in September this year. This meeting will invite domestic and foreign experts and scholars renowned for their outstanding achievements in the fields of optoelectronic imaging, photoelectron detection, image processing, optoelectronic system design, manufacturing and testing, and related technologies and applications. It is estimated that the scale of this meeting will reach 400 ~ 500 people.