为了保证大规模和超大规模集成电路制造工艺过程中在光掩膜板或半导体片上元件布局结构几何尺寸的计量统一,绝大部分生产厂家都是使用文献[1]中未规定的专用长度量具。这些量具很不统一。现人为地将其分为几类:长度刻线样板、射衍光栅、线宽样板、对准样板。在苏联计量工作中应用最广的是根据 In order to ensure the uniform measurement of the geometric dimensions of the layout structure of elements on photomasks or semiconductor wafers during the manufacturing process of large-scale and very large-scale integrated circuits, most manufacturers use the special-purpose measuring tools not specified in [1]. These gauges are very inconsistent. It is artificially divided into several categories: the length of the groove model, the diffraction grating, line width model, alignment model. The most widely used in the measurement work in the Soviet Union is based on