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研究了XeCl激光精细刻蚀玻璃、金刚石等材料的能流阈值和单脉冲能流密度、激光脉冲重复频率等激光参数对单脉冲刻蚀深度的影响，并与理论计算结果进行了比较，为XeCl激光在该加工领域的实际应用提供了实验数据和理论依据。
The influence of laser parameters such as energy flow threshold, single-pulse fluence and laser pulse repetition rate on the single-pulse etching depth of XeCl laser fine etching glass and diamond were studied. The results were compared with the theoretical calculation results, The practical application of laser in the field of processing provides experimental data and theoretical basis.