论文部分内容阅读
A new Enhanced Glow Discharge Plasma Ion Implantation methods are introduced, in which the plasma are produced by the self glow discharge excitated by high negative voltage bias. The electric field is designed to a electron focusing mode by using a small area hollow anode and a large area sample holder cathode. The pattern of equipotentials of the electric field are calculated through finite-element method. By using the special electron-focusing field, the self glow discharge are enhanced and provide denser ions to implanted into the substrate.