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类金刚石薄膜和氮化硅薄膜都是性能很好的绝缘材料,可以用于对磁盘进行保护,在本文中主要讨论了它们各自的制备方法。随着巨磁阻读写磁头(g ian tm agneto-res istive heads)技术的引入,磁盘的存储密度以每年100%的速度在增加,这就要求磁盘保护膜的厚度要尽量的小,所以对制备方法有一定的要求。对类金刚石磁盘保护膜,可以使用等离子体磁控溅射沉积、磁过滤阴极弧沉积、等离子体化学气相沉积来制备;对氮化硅磁盘保护膜,可以使用射频反应溅射沉积来制备。
Diamond-like carbon films and silicon nitride films are well-behaved insulating materials that can be used to protect the disks. In this article, their respective preparation methods are discussed. With the introduction of gigantic read heads (magnetic heads), the storage density of disks increases at 100% per year, which requires that the thickness of the disk protection film be as small as possible Preparation methods have certain requirements. For diamond-like disk protection films, plasma magnetron sputtering deposition, magnetic filtration cathode arc deposition, and plasma chemical vapor deposition may be used for the preparation of the diamond-like disk protection film. The silicon nitride disk protection film may be prepared by radio frequency reactive sputtering deposition.