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随着我国微电子技术的飞速发展,要求研制分辨率高、工作视场大的光刻设备。利用双球面反射系统的环带成象,辅之以机械的移动扫描,我们设计了比较适合我国现状的掩模复印机,设计原意是力求做到结构简单、可靠、实用和便于制造。作为第一步,第一台样机要求可复印3～4微米线条,视场50×50平方毫米。本文叙述了该移动扫描式掩模复印机的光学系统总体方案设计;1:1双球面反射系统的计算概要;一些几何象差和光学传递函数的计算结果。试制的第一台样机实拍结果1.4微米线条日视可见,投影系统对3微米线条可以复制出较好的象线。经过制造和装校工艺上的改进,有希望可用于2.5微米线条的复印。
With the rapid development of microelectronics technology in our country, it is required to develop lithography equipment with high resolution and large working field of view. Using the double-spherical reflection system of the ring imaging, combined with the mechanical movement of the scan, we designed a more suitable mask for our current status of the copier, the original design is intended to be simple, reliable, practical and easy to manufacture. As a first step, the first prototype required 3 to 4 microns of photocopying lines and a field of view of 50 x 50 mm2. This paper describes the overall design of the optics system of the mobile scanning mask copier; the outline of the calculation of the 1: 1 double spherical surface reflection system; some geometrical aberrations and the calculation results of the optical transfer function. Trial production of the first prototype real results 1.4 microns line visible as long as the projection system on the 3 micron lines can be copied better lines. After the manufacturing and assembly process improvements, there is hope for 2.5 micron lines of photocopying.