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针对X射线自支撑透射光栅在多能点单色成像光栅谱仪中的应用,采用电子束和光学匹配曝光、微电镀和高密度等离子体刻蚀技术,成功制备了周期为500nm、金吸收体厚度为350nm、占空比接近1∶1,满足三个能点成像需求的2000lp/mm X射线自支撑透射光栅。首先利用电子束光刻和微电镀技术制备金光栅图形,然后采用紫外光刻和微电镀技术制作自支撑结构,最后通过腐蚀体硅和感应耦合等离子体刻蚀聚酰亚胺完成X射线自支撑透射光栅的制作。在电子束光刻中,采用几何校正和高反差电子束抗蚀剂实现了对纳米尺度光栅图形的精确控制。实验结果表明,同一个器件分布的三块光栅占空比合理,栅线平滑,可以满足单能点单色成像谱仪的要求。
Aiming at the application of X-ray self-supporting transmission grating in multi-point monochromatic imaging grating spectrometer, the electron-beam and optical matching exposure, micro-electroplating and high-density plasma etching technology were used to successfully prepare a gold absorber Thickness of 350nm, duty cycle close to 1: 1, to meet the needs of three imaging point 2000lp / mm X-ray self-supporting transmission grating. Firstly, the gold grating pattern was prepared by electron beam lithography and micro-electroplating technology, and then self-supporting structure was fabricated by UV lithography and micro-plating technology. Finally, the polyimide was etched by etching silicon and inductively coupled plasma to complete X-ray self-supporting Transmission grating production. In electron beam lithography, precise control of the nanoscale grating pattern is achieved using geometric correction and high contrast e-beam resists. Experimental results show that the three gratings with the same device have a reasonable duty cycle and a smooth grid line, which can meet the requirements of a single-energy monochromatic imaging spectrometer.