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采用辉光弧光协同共放电混合镀方法在A3碳钢基体上沉积氮化钛薄膜,通过改变Ar/N2流量比,研究Ar/N2流量比对TiN薄膜结构及硬度的影响。X射线衍射谱图表明制备的TiN有明显的(111)晶面择优取向;Ti2p的X射线光电子谱谱峰拟合分析表明Ti2p1/2峰和Ti2p3/2峰均有双峰出现,可知氮化物中的Ti存在不同的化学状态,整个膜层是由TiN,TiO2,TiNxOy化合物组成的复合体系,Ar/N2流量比影响各成分的含量。对比硬度的变化和组成成分之间的关系发现,膜层硬度随着含TiN量的增多而增大,当Ar/N2流量比为3∶1时,硬度最大。
The titanium nitride film was deposited on a A3 carbon steel substrate by a glow-arc co-discharge co-plating method. The effect of Ar / N2 ratio on the structure and hardness of the TiN film was investigated by changing the Ar / N2 ratio. X-ray diffraction patterns show that the prepared TiN has a preferential orientation of (111) crystal plane. The fitting analysis of Ti2p by X-ray photoelectron spectroscopy shows that both Ti2p1 / 2 and Ti2p3 / 2 peaks appear as bimodal. In the presence of different chemical states of Ti, the entire film is composed of TiN, TiO2, TiNxOy compound system, Ar / N2 flow ratio of the content of each component. Comparing the changes of hardness and the relationship between the components, it is found that the hardness of the film increases with the increase of TiN content. When the Ar / N2 flow ratio is 3: 1, the hardness is the highest.