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美帝贝尔电话实验室正在研制一种用于制作集成电路的实验性透明光掩模,据称它兼有通用光掩模所达不到的耐久性和精度。同时它比铬或乳胶掩模有更好的抗蚀性。这种新的金属——氧化物掩模既具一般透明乳胶掩模透明和易于对准的特性,又具有铬掩模的耐久性。同时,它解决了乳胶掩模的不耐用问题和铬掩模的不透明和针孔问题。贝尔实验室的试验表明,金属一氧化物掩模比铬掩模更耐用。在金属一氧化物模中根本不存在针孔。在研究新的
The Telebill Telephone Laboratory is developing an experimental clear photomask for making integrated circuits that is said to have both the durability and precision that conventional photomasks can not achieve. At the same time it is better than chromium or latex mask corrosion resistance. This new metal-oxide mask combines both the transparent and easy-to-align properties of a generally transparent latex mask with the durability of a chromium mask. At the same time, it addresses the problem of non-durability of latex masks and opaque and pinhole problems of chromium masks. Bell Labs tests show that metal oxide monoliths are more durable than chromium masks. There are no pinholes at all in the metal oxide scale. In research new