双极集成电路要实现超大规模集成化和高速化,一方面要缩小元件尺寸,另一方面必须改进元件之间的隔离方法.用U型槽隔离技术不仅缩小了实际晶体管的尺寸,而且使寄生电容减小到最低限度,从而提高了电路的性能.基区-发射区(顶部n~+区)面积比已经减小到2,而标准pn结隔离,典型的比值为10,氧化层隔离结构,此比值为5.这样大大 Bipolar integrated circuits to achieve large-scale integration and speed, on the one hand to reduce component size, on the other hand must improve the isolation between components .Use of U-channel isolation technology not only reduces the size of the actual transistor, and parasitic The capacitance is reduced to a minimum, thereby improving the performance of the circuit.The area ratio of the base-emitter (top n + region) has been reduced to 2 while the standard pn junction isolation with a typical ratio of 10, the oxide isolation structure , This ratio is 5. Such a big