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IVD(Ion and Vapour Deposition)法即离子注入与真空气相沉积复合方法,是目前较新的涂层工艺方法。其涂层模型如图1所示。图中白色小球代表高速运动的离子”黑球代表基体原子,灰色大球代表气体状态的涂复材料之一的原子。离子以10—20KeV动能使气态原子、离子与基体原子混合,在基体表层形成混合相,进而成长为具有新性质的涂层薄膜。控衬离子电流密度和蒸发原子的速度即可任意变更涂层薄膜的构成比。图2为试制的IVD装置,圈中1为冷阴极型离子源(某种轻元素气体)及其加速系统;2为质量分析系统、将高温状态离子中混入的各种不纯物质予以分离,使其不进入反应室;3为阀门;4为控制离子电流密度和均匀溅射区城的遗镜系统及其反馈电极;5为电子束蒸发装置;6为试件(涂层基
IVD (Ion and Vapor Deposition) method that ion implantation and vacuum vapor deposition composite method, is a relatively new coating process. The coating model shown in Figure 1. The white beads represent the high-speed moving ions "The black ball represents the atoms of the matrix, and the big gray sphere represents the atoms of the gas-state coating material. The ions are mixed with gaseous atoms and ions with the atoms of the matrix by kinetic energy of 10-20 KeV, The surface layer to form a mixed phase, and then grow with a new nature of the coating film controlled film ion current density and the rate of evaporation of atoms can be arbitrarily changed the composition ratio of the coating film Figure 2 is a prototype IVD device, ring 1 cold Cathode type ion source (some light element gas) and its acceleration system; 2 is a mass analysis system, which separates various impure substances mixed in the high-temperature state ions into the reaction chamber; 3 is a valve; 4 is a Control the ionic current density and uniform sputtering area City mirror system and its feedback electrode; 5 for the electron beam evaporation device; 6 for the test piece (coating base