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准晶态合金具有许多晶态合金无法比拟的特性,如低电导率、低导热率和负温度系数、抗磁性、高硬度、低摩擦系数和耐蚀性等。准晶合金做为涂层和薄膜材料具有重要的潜在应用价值。准晶合金薄膜由于对其成份的特殊要求,一般方法难以制备。本文首先介绍了激光-真空弧薄膜沉积技术和自行研制的相关设备。利用该设备,在Si<111>基体表面制备了Al65Cu20Fe15准晶态合金薄膜。研究了所制备薄膜的厚度、颗粒度等与薄膜制备过程中激光脉冲频率、引弧电压和靶材—衬底间距等工作参数之间的对应关系。结果表明,通过调整工艺参数,可以有效的改善成膜质量。薄膜沉积所用的靶材是电磁感应熔炼制备的Al65Cu20Fe15准晶整体材料。沉积在衬底上的薄膜是与准晶合金成分接近的非晶态薄膜。为了得到准晶态合金膜需对其进行退火处理,本文探讨了退火温度、与膜成分、组织结构的变化趋势之间的关系。
Quasicrystalline alloys have many properties that are unmatched by crystalline alloys such as low conductivity, low thermal conductivity and negative temperature coefficient, diamagnetic, high hardness, low coefficient of friction and corrosion resistance. Quasicrystalline alloys have important potential applications as coatings and thin films. Quasicrystalline alloy films due to the special requirements of its composition, the general method is difficult to prepare. This paper first introduces the laser - vacuum arc film deposition technology and self-developed related equipment. Al65Cu20Fe15 quasicrystalline alloy thin films were prepared on the surface of Si <111> substrate. The relationship between the thickness and particle size of the prepared thin films and the operating parameters such as laser pulse frequency, arc ignition voltage and target-substrate spacing was studied. The results show that by adjusting the process parameters, the film quality can be effectively improved. The target of thin film deposition is Al65Cu20Fe15 quasicrystal monolithic material prepared by electromagnetic induction melting. The film deposited on the substrate is an amorphous film that is close to the composition of the quasicrystalline alloy. In order to obtain the quasicrystalline alloy film to be annealed, this paper discusses the relationship between the annealing temperature and the changing trend of the film composition and microstructure.