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采用电子束蒸发的方法在石英基片上一次沉积厚度约为400nm的ZnS与PbS混合薄膜多个样品,随后将不同样品在3×10-3Pa的真空中分别以100～600℃退火1h.样品的成分、结晶性能、表面形貌和光学性质分别采用X射线能量色散谱、X射线衍射仪、扫描电子显微镜、原子力显微镜和分光光度计等进行检测.结果表明,制备态样品为非晶态,300℃真空退火的样品已开始结晶;当退火温度不低于500℃时,退火过程中,混合薄膜中的PbS大量挥发,退火后样品中的PbS含量明显减小.随着退火温度从100℃升高到600℃,样品的表面粗糙度和表面颗粒尺寸是先减小、后增大;光学透射率则呈现先升高后下降再升高的变化特性;退火后混合薄膜光学性质的变化与薄膜的成分、结晶性能和表面形貌的变化密切相关.
A sample of ZnS and PbS mixed thin films with a thickness of about 400 nm was deposited on a quartz substrate by electron beam evaporation at a time. Then, different samples were annealed at 100-600 ° C. for 1 h in a vacuum of 3 × 10 -3 Pa, respectively The composition, crystallinity, surface morphology and optical properties of the samples were examined by X-ray energy dispersive spectroscopy, X-ray diffraction, scanning electron microscopy, atomic force microscopy and spectrophotometer, respectively. When the annealing temperature is not lower than 500 ℃, PbS in the mixed thin film is greatly volatilized during the annealing process, and the content of PbS in the annealed sample decreases obviously.With the annealing temperature rising from 100 ℃ At 600 ℃, the surface roughness and surface particle size of the samples first decrease and then increase, while the optical transmittance increases first and then decreases and then increases. The changes of the optical properties of the hybrid films after annealing are similar to those of the films The composition, the crystallization performance and the change of the surface topography are closely related.