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用高功率直流电弧等离子体喷射方法研究金刚石膜沉积温度稳定性对膜中黑色缺陷产生的影响。结果表明,在温度稳定条件下制备的金刚石膜中,黑色缺陷的密度较低;当沉积温度大幅度变化时,在膜中产生大量黑色缺陷。形成大量黑色缺陷的原因是:沉积温度变化时,在金刚石晶粒的表面形成贯穿型孪晶,而在随后的生长过程中,这些孪晶的长大将抑制金刚石膜局部生长环境中活化的反应气体与其下晶界位置的金刚石组织接触,导致其生长缓慢并保留在金刚石膜中,从而形成大量黑色缺陷。
The influence of the temperature stability of diamond film deposition on the black defects in the film was studied by high-power DC arc plasma jet method. The results show that the density of black defects is low in the diamond films prepared under the condition of temperature stability. When the deposition temperature changes drastically, a large number of black defects are generated in the films. The reason for the formation of a large number of black defects is that when the deposition temperature changes, penetrating twins form on the surface of the diamond grains, and growth of these twins will inhibit the activated reaction gas in the local growth environment of the diamond film during the subsequent growth Comes into contact with the diamond tissue at the lower grain boundary, causing it to grow slowly and remain in the diamond film, resulting in a large number of black defects.