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1982年9月13-17日在西德巴伐利亚州贝希特斯加登举行了第四届国际离子注入会议,会议代表200多人,来自20多个国家。这次会议收到特约论文12篇和55篇论文,会议主要讨论离子注入设备和工程技术问题以及注入在半导体和金属中、特别是在金属加工中的应用等。该会议文集共分9部分,即:离子注入机、离子源,离子注入机的子系统、特殊注入技术、离子束印刻术、测量技
The Fourth International Ion Implantation Conference was held in Berchtesgaden, West Germany, September 13-17, 1982, with more than 200 delegates from over 20 countries. The meeting received 12 dissertations and 55 papers, focusing on ion implantation equipment and engineering issues as well as the injection of semiconductors and metals, especially in metal processing applications. The conference proceedings are divided into 9 parts, namely: ion implanter, ion source, ion implanter subsystem, special injection technology, ion beam lithography, measurement technology