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GX—4型分离视场显微镜,是为配套我所研制的GK一4型半自动光刻机而设计的。其主要特点是成象清晰度好,景深长,观察光线舒适柔和,没有光学“漂移”。这就为提高光刻对准的速度和精度带来了许多方便之处,同时也为接近式光刻提供了有效的观察系统。另外,在机械结构上与曝光用的多点光源联接在一起,曝光时,显微镜本体不动,从而提高了设备的稳定性和可靠性。
GX-4-type separation of the field of view microscope, is supporting the development of my GK-4 semi-automatic lithography machine and design. Its main features are good image clarity, long depth of field, comfortable and gentle observation of light, no optical “drift.” This brings many advantages to speed and accuracy of lithographic alignment and provides an effective viewing system for proximity lithography. In addition, the mechanical structure and exposure with a multi-point light source connected together, exposure, the microscope body does not move, thereby enhancing the stability and reliability of the device.