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TiO_2 nanoparticulate films were prepared by means of Plasma-enhanced Chemical Vapor Deposition (PECVD). By further surface treatment by TiCl_4 or O_2 plasma, films with dif- ferent surface properties were obtained. It was found that treatment by TiCl4 plasma enhanced the amount of Ti3+ suiface state and Ti dislocation of the film, detected by the surface photovoltage spectroscopy, while O_2 plasma surface treating enhanced its amount of O_2 surface state. It was also indicated by the H_2O adsorption experiment that film treated by O_2 plasma had larger separation efficiency for photogenerated carriers than the one treated by TiCl_4 plasma.
TiO 2 nanoparticulate films were prepared by means of Plasma-enhanced Chemical Vapor Deposition (PECVD). Further was treatment by TiCl 4 or O 2 plasma, films with dif- ferent surface properties were obtained. It was found that treatment by TiCl 4 plasma enhanced the amount of Ti3 + suiface state and Ti dislocation of the film, detected by the surface photovoltage spectroscopy, while O_2 plasma surface treating enhanced its amount of O_2 surface state. It was also indicated by the H 2 O adsorption experiment that film treated by O 2 plasma had larger separation efficiency for photogenerated carriers than the one treated by TiCl_4 plasma.