一、引言MIS结构在半导体工艺控制和测量中已经得到广泛应用,尤其在半导体薄膜和界面研究方面更是不可缺少。要从C-V技术获得正确的结果,必须注意选择适当的测试条件,且必须对测试中遇到的各种反常现象进行正确分析。这样不仅可以避免从反常的C-V曲线引出 I. Introduction MIS structure has been widely used in semiconductor process control and measurement, especially in the research of semiconductor thin film and interface. To get the right result from C-V technology, care must be taken to select the appropriate test conditions and the correct analysis of the various anomalies encountered in the test. This will not only avoid the abnormal C-V curve leads